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DisChem's E Beam Lithography Charge Dissipation Agent is designed to reduce charge accumulation in EBL processes. Our solution ensures consistent pattern quality and minimizes defects on insulating substrates by effectively dissipating excess charge. This agent is crucial for maintaining the precision and reliability of EBL processes, especially in applications requiring high-resolution patterning.
Contact Us Phone Number : +1( 814 )-7726-603 Email ID : info@discheminc.com Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, PA 15853 USA
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Ad Detail: E Beam Lithography Charge Dissipation Agent
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